Figure 2.5: Schematic LEED Data Acquisition System. The video camera views the diffraction pattern of the sample (SH) on the retarding-field analyzer (RFA) through the window (W) of the vaucum system (UHV).
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Figure 2.1
: Schematic
LEED-AES
retarding-field analyzer (RFA).
Figure 2.2
: Schematic
LEED
pattern for Si{111} 1x1.
Figure 2.3
: Schematic
LEED
pattern for Si{111}rt3*rt3-30-X.
Figure 2.4
: A
LEED
pattern of Si{111}7*7, at 100 eV.
Figure 2.5
: Schematic
LEED
Data Acquisition System.
Figure 2.6
: Reliability-factor (R_VHT, r_ZJ, and R_P) contour plots for the surface of TB{11-20}.
Figure 2.7
: Schematic
AES
Data Acquisition System.
Figure 2.8
: Typical Auger electron spectrum for Au deposited upon a Si{111} surface.
Figure 2.9
: Schematic
LEED-AES
Surface Analysis UHV System.